|  | ELECTROMIGRATION INDUCED HILLOCK DYNAMICS ON THE INTERCONNECT SURFACE Two Fold Crystal Symmetry, {110} Planes in FCC The interconnect line with zero degree tilt angle and having a Gaussian shape of
          edge- Hillock shows two different types evolution behavior depending upon the
          applied electron wind intensity. As can be seen in Figure, at very low current
          densities χ≤5 , the Hillock due time completely disappears leaving behind almost
          perfect flat surface. At low to high current densities, the situation is completely
          different. The top of the Hillock starts to over hangs on the leeward side. On the
          other hand, the lee side of the Hillock becomes more and more protruding deep into
          the bulk region, creating a bottle neck. The finally, the intruding part of the Hillock
          breaks down from the bottle neck portion becomes an interior wedge void. This
          newly created inner void, the size of which is somehow smaller higher the applied
          electron wind intensity, drifts towards the cathode end. The remaining part of the
          Hillock has still very long intrusion, which may act as a source for the multiple
        inner void generations by breaking-up. | 
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